MacGillavry lace Fellowships group leaders ARCNL

Position: 3 MacGillavry and Lovelace Fellowships for group leaders ARCNL.
Mac Gillavry and Lovelace Fellowships for Group Leaders at ARCNL  Together with the Advanced Research Center for Nanolithography (ARCNL), the Faculties of Science of the University of Amsterdam and the Vrije Universiteit Amsterdam are organizing a combined round of the prestigious  Mac Gillavry Fellowship  and  Lovelace Fellowship programmes . We are asking  female researchers  who have a good match with the ARCNL research programme and the potential and ambition to obtain a leadership position as (assistant/associate/full) professor at either of the two universities to apply.

Position Overview  The ARCNL is a unique public-private partnership between Dutch universities as public parties and ASML as a private industry partner. ARCNL focuses on fundamental physics and chemistry in the context of technologies for (nano) lithography, primarily for the semiconductor industry. The center has three departments:
Materials (3 groups), (EUV) Source (3 groups), and Metrology (5 groups) with about 100 employees in total.
ARCNL is looking for three group leaders with either experimental or modeling/theoretical focus. You will conduct your research in collaboration with other research groups in ARCNL. As a group leader, you will be employed by and part of the Faculty of Science of either the University of Amsterdam or the Vrije Universiteit Amsterdam, appointed as assistant or associate professor level, depending on your experience.

For exceptionally experienced and qualified candidates, appointment starting as Full Professor could be considered. Working at ARCNL implies having a reduced teaching load compared to other university staff.
Responsibilities  As a group leader, you will:
Initiate a novel research program, aligned with the long-term challenges of ASML Research and the ARCNL science program;
Establish and maintain an active collaboration with ASML Research;
Collaborate actively with the other research groups at ARCNL;
Direct your own group members and supervise the projects within your group;
Be responsible for the budget, planning, and quality of the projects in the group;
Publish your work in leading international journals;
Present the work at conferences and research institutes in the Netherlands and abroad;
Develop and maintain external relations, both nationally and internationally;
Acquire national and international financial support;
Be an active member of the faculty staff of the Faculty of Sciences of the University of Amsterdam (UvA) or the Faculty of Science at the Vrije Universiteit Amsterdam (VU);
Contribute to the teaching programs of the UvA and the VU.
Qualifications  We invite you to apply if you have the following qualifications:
PhD in physics, chemistry or materials science;

Working experience and a scientific track record in atomic, molecular, plasma, or instrumental physics;
Willingness to teach at university level and demonstrable didactic abilities;
Preferably experience with the (co-)supervision of BSc, MSc and/or PhD students;
Ability to attract external funding;
Excellent communication and social skills;
Excellent command of English and willingness to learn the Dutch language;
Experience and affinity with collaborations between industry and academia forms an advantage.
Work Environment  The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the Vrije Universiteit Amsterdam (VU), the University of Groningen (RUG) and the semiconductor equipment manufacturer ASML, and consists of approximately 100 scientists and support staff.
Application Process  

To apply , please submit PDF files containing:
A motivation letter, including why the special position ARCNL takes up as a connector between academic scientific research and advancing technology in an industrial setting sparks your interest;
A resume;
A list of publications;
Names and contact details of 3 references.
The final application date is  18 October 2024.
Online screening may be part of the selection.
Diversity Code  ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

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